Advanced 99.7 Alumina Ceramic Component for Ion Implantation

Product Overview

Made of high-grade 99.7% high-purity alumina, this series of precision ceramic parts is manufactured via high-temperature sintering and ultra-precision finishing, specially tailored for semiconductor ion implantation equipment. It features excellent high voltage insulation, strong plasma erosion resistance, extremely low outgassing and zero particle shedding. It keeps stable mechanical and electrical performance under high vacuum, high temperature and intense ion beam environments. Custom dimensions, tight tolerance processing and OEM customized solutions are supported to match various equipment installation standards.

Key Technical Specifications

✅ Material: 99.7% High Purity Alumina (Al₂O₃), metallic impurities ≤50ppm

✅ Density: 3.9 g/cm³, fully compact & gas impermeable structure

✅ Flexural Strength: 350-400 MPa, outstanding structural firmness

✅ Hardness: 1500 HV, Mohs 9, superior wear & scour resistance

✅ Max Continuous Operating Temperature: 1600°C (2912°F)

✅ Thermal Shock Resistance: Resist temperature swing over 500°C

✅ Electrical Performance: Extra high insulation, reliable high voltage separation

✅ Surface Finish: Precision ground Ra 0.4μm, optional super polishing Ra＜0.1μm

✅ Dimensional Accuracy: Strict tolerance within ±0.02mm

✅ Environmental Performance: Low volatile content, vacuum & clean room applicable

## Core Applications

1. Ion Implantation Equipment

Ion beam pipeline parts, high-voltage insulators and isolation components, avoiding electric leakage and ion beam offset.

2. Semiconductor Wafer Manufacturing

High-purity clean process components, non-polluting and fully meeting chip production requirements.

3. High Vacuum Chamber Assembly

Built-in vacuum insulation components, stable service without deformation and aging.

4. Plasma & Ion Beam Process

Anti-sputtering ceramic accessories, effectively prolong service life and cut maintenance cost.

5. Semiconductor Precision Transfer & Positioning

Stable ceramic support and locating parts for high-precision semiconductor production procedures.